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Modeling the Charging Effect on the Twisting Defects During High Aspect Ratio Etching of Dielectrics
Abstract: In high-aspect-ratio (HAR) plasma etching of dielectrics, random twisting is frequently observed. The charging effect is considered a potential factor influencing this twisting. We develop a ...
Department of Physics, National Taiwan University, Taipei 106, Taiwan, Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan, National Synchrotron Radiation Research Center, ...
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